There are many types of sputtering targets, high purity requirements, and a wide range of application industries. Today we will talk about the four types of sputtering targets commonly used in four fields, high-purity aluminum targets, titanium targets, tantalum targets, and tungsten targets. Titanium target. Areas they cover include flat panel displays, semiconductors, storage and solar cells.
Aluminum target (stock purity 99.99% - 99.999%)
High-purity aluminum and its alloys are one of the most widely used conductive thin-film materials. In its field of application, the manufacture of VLSI chips requires sputtering target metals of very high purity, typically as high as 99.9995%, while flat panel displays and solar cells have slightly lower metal purity.
Titanium Target (Stock Purity 99.99% - 99.999%)
Titanium is one of the commonly used barrier film materials in VLSI chips (the corresponding conductive layer material is aluminum). The titanium target will be used with the titanium ring during pre-chip fabrication. The main function is to assist the sputtering process of titanium targets, which is mainly used in the field of ultra-large-scale integrated circuit chip manufacturing.
Titanium tungsten target (stock purity 99.95%)
Tungsten-titanium alloys have low electron mobility, stable thermomechanical properties, good corrosion resistance, and good chemical stability. In recent years, tungsten-titanium alloy sputtering targets have been used as contact layer materials for gate circuits of semiconductor chips. In addition, tungsten and titanium targets can also be used as barrier layers in the metal connection of semiconductor devices. For high-temperature environments, mainly for vlsI and solar cells.
Tantalum target (stock purity 99%, 99.5%, 99.9%, 99.995%, 99.99%, 99.995% 99.999%)
With the explosive growth of demand for consumer electronic products such as smartphones and tablet computers, the demand for high-end chips has increased significantly, and tantalum has become a popular mineral resource. However, the scarcity of tantalum resources makes high-purity tantalum targets expensive, which are mainly used in large-scale integrated circuits and other fields.
Baoji Yusheng Metal Technology Co., Ltd. is a high-tech enterprise specializing in the production and sales of sputtering tantalum targets and refractory non-ferrous metal materials. The products are widely used in petroleum, chemical, electronic, handicraft, machinery manufacturing, medical equipment, and other fields. Products are exported to countries at home and abroad.
