Today, Baoji Yusheng Metal Technology Co., Ltd. shipped a tantalum target. The tantalum target is large in size, with exquisite production technology and smooth and bright surface. The target has high flatness and very flat surface. The surface cleanliness is high, and there is no oil, dust and oxide on the surface.
Yusheng Metal can use a variety of processes to produce targets according to customer requirements.
Vacuum melting method:
Process: Melt tantalum metal in a vacuum environment.
Advantages: Avoid oxidation and impurities to ensure high purity of the target.
Hot isostatic pressing technology:
Process: Use high temperature and high pressure to densify tantalum powder into a target.
Advantages: Produce a high-density and uniform target structure.
Electron beam melting method:
Features: Use electron beam as a heat source to melt tantalum metal.
Advantages: The melting process can be precisely controlled to improve the uniformity and purity of the target.
Plasma Spin Coating Technology:
Features: Deposit tantalum material on a rotating substrate using plasma technology.
Advantages: Capable of producing targets with specific microstructures for special applications.
