Name: Tantalum (Ta Target)
Type: Plane target, multi-arc target, round target, rotating target
Grain size: 45 microns
Purity: 99.99%, 99.999%
Surface roughness: Ras0.8um (sputtering surface), Ras6.4um (for metallization)
Target size φ25, 30, 40, 50.5, 60, 76.2, 80, 100, 101.6mm, T: 0.2-10mm, etc.
Applicable equipment for tantalum target: Applicable to various single-target sputtering systems, multi-target sputtering systems, ion sputtering systems and other magnetron sputtering equipment of North Huachuang, Zhongke Keyi, Shenyang Keyi, China Electronics Technology, Institute of Microelectronics, Jinsheng Micro-Nano, Techno Denton Vacuum, etc.
Tantalum target application areas: production and scientific research applications, optics, micro-nano processing, devices and other industries, widely used in semiconductor chips, solar light
Type: flat target, multi-arc target, round target, rotating target, flat display, special coating and other coating products.
Contact: Kelly
Email: kd@tantalumysjs.com
Whatsapp/Skype：+86 13379388917
Phone/WeChat: +86 13379388917
Fax: 0917-3139100
Post code: 721013
Web:www.tantalumysjs.com
Add：Wenquan village Industrial Zone, Gaoxin Development Zone, Baoji City, Shaanxi Province, China
