Molybdenum (10%) niobium alloy sputtering targets have broad application prospects in thin-film solar cells and displays. However, due to the absorption of oxygen by niobium powder during sintering, the sintered molybdenum-niobium blank has a high oxygen content and low density. This time, niobium powder with niobium carbon coating was prepared by chemical vapor reaction under CH4 atmosphere.
The niobium carbon layer not only helps to prevent the absorption of oxygen, but also can be completely consumed by reacting with oxygen at the required temperature.
The effects of preparation method, reaction medium and reaction parameters on the performance of niobium carbon layer were studied, and the optimal process conditions were determined as follows: temperature 600℃, reaction time 270min, and gas pressure 0.04mpa.
The surface morphology, chemical composition, distribution and uniformity of the coating were characterized by scanning electron microscopy, X-ray photoelectron spectroscopy, electron probe microanalysis, Raman spectroscopy and atomic force microscopy.
The oxygen and carbon contents were determined by ONH and CS analyzers. The surface modified niobium powder was mixed with molybdenum powder and vacuum sintered to obtain a Mo-10%Nb blank with an oxygen content of 190ppm, a carbon content of 290ppm and a relative density of 93%.
Uses of niobium targets
Niobium sputtering targets, as the key component of niobium and its alloy films, are widely used in corrosion-resistant environments such as solar cells, color TFT LCD screens, optical lenses, electronic imaging, information storage, glass coatings, as well as transportation, chemical production, etc.
Today, niobium sputtering targets are mainly used in surface coatings of advanced touch screens, flat panel displays, and energy-saving glass. It has an anti-reflective effect on glass screens.
High-purity niobium targets are available in various forms, purities, sizes and prices. Please consult us for details!
