1. Using a magnetron to sputter
There are three types of magnetron sputtering: radio frequency, intermediate frequency, and DC sputtering.
A. The deposition film density is low and the DC sputtering power supply is inexpensive. Typically, domestic photothermal and thin film batteries opt to employ the technique since it requires little energy and uses conductive metal as the sputtering target.
B. The energy of the RF sputtering is rather high. A conductive target or a non-conductive target can be used as the sputtering target.
C. A metal or ceramic target can be used as the medium frequency sputtering target.

2. Sputtering targets' classification and use
Sputtering targets come in a variety of shapes and sizes, and they are not all categorized in the same way. They can be categorized into long targets, square targets, and round targets based on shape, and into metal targets, alloy targets, and targets made of ceramic compounds based on composition. It can be separated into ceramic targets linked to semiconductors, ceramic targets for recording media, ceramic targets for displays, etc. based on various application domains.Electronics and information sectors, including the storing of information, are the principal users of sputtering targets. Hard disks, magnetic heads, optical disks, and other related thin film products are created in this business using sputtering targets.

Currently.The market for recording medium ceramic targets is seeing an increase in demand due to the information industry's ongoing growth, and recording medium target research and development are now receiving a lot of media attention.