In recent years, semiconductor technology has developed rapidly, and the demand for tantalum used as a sputtered film has gradually increased. In integrated circuits, tantalum is placed between silicon and copper conductors as a diffusion barrier. Production methods for sputtering tantalum targets include ingot metallurgy (I/M) and powder metallurgy (P/M). Tantalum targets with lower requirements are generally made of tantalum ingots. However, in some cases with higher requirements, the I/M method cannot be used, and the powder metallurgy method can only be used to produce it. For example, the I/M method cannot produce alloy targets because of the different melting points of tantalum and silicon, and the low toughness of silicon compounds.
Substances that contaminate the semiconductor device must not be present in the film formation. When the sputtering film is formed, if there are impurities in the tantalum (alloy, compound) target, the impurities will be introduced into the sputtering chamber, causing coarse particles to attach to the substrate and short-circuit the thin film circuit. At the same time, impurities can also be the reason for the increase of protrusion particles in the thin film. Impurity gases such as oxygen, carbon, hydrogen, and nitrogen in the target will cause abnormal phenomena and cause problems in the uniformity of the formed film. In addition, for the powder metallurgy method, the uniformity of the deposited film is a function of the grain size in the target, and the finer the grain in the target, the more uniform the film obtained. Therefore, there is a need in the art for high quality tantalum powders and tantalum targets. Therefore, in order to obtain high-quality tantalum powder and tantalum target, it is necessary to reduce the impurity content in tantalum powder and increase the purity of tantalum powder.
Baoji Yusheng Metal Technology Co., Ltd. can produce tantalum powders of various particle sizes. Under the premise of ensuring high quality, our company has a complete range of tantalum metal powders, which can meet the needs of various customers in research and development, testing, production, consumption, etc. need.
