High Purity Vanadium Sputtering Target

High Purity Vanadium Sputtering Target

Products: High-purity vanadium target Grade: V Vanadium content: 99.9% Brand: Yusheng Metal Classification: Flat vanadium target, step vanadium target, multi-arc vanadium target Size range: φ3-φ120*Lmm, customized by drawing Use of vanadium target: mainly coating industry, electronics industry, flat panel display industry, etc.
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Product Introduction

 

Advantages of Yusheng Metal

High purity: Yusheng Metal uses advanced vacuum melting and powder metallurgy technology to produce high-purity vanadium sputtering targets. Yusheng Metal has senior technical engineers who are proficient in the processing of products.

 

Excellent uniformity: Yusheng Metal's high-purity vanadium sputtering targets have uniform grain size, high density and consistency. The company also uses advanced surface treatment technology to ensure the best bonding strength between the target and the substrate, resulting in excellent film quality.

 

Customized size and shape: Yusheng Metal can produce high-purity vanadium sputtering targets in various shapes and sizes to meet the specific requirements of customers. The company's products are highly flexible and can be tailored to meet the diverse needs of the industry.

 

Competitive price: Yusheng Metal's high-purity vanadium sputtering targets are integrated from raw materials to processing, maximizing efficiency and reducing costs, thereby producing products that are both affordable and high-quality.

 

Yusheng Metal's high-purity vanadium sputtering targets have several advantages that make them the first choice for customers in the semiconductor and display industries. With its commitment to quality, customization, and cost-effectiveness, the company is well-positioned to meet the changing market demands and establish itself as a leader in the industry.

 

Vanadium target parameters

Product name

high-purity vanadium sputtering targets:

Brand

V

Density

>6.11g/cm3

Melting point

1919 ℃

Supply status:

Flat vanadium target material, stepped vanadium target material Multi arc vanadium target material

Size range

10-300mm, customized according to customer needs

Purpose

Mainly used in the coating industry

 

Products Show

product-3264-2448

 

FAQ

How is the quality of your products?
We are one of the earliest enterprises in China to develop rare metal materials, and we have a certain level of experience and practice. We have the required certificates from Fu and.
We need a faster delivery time, can you meet it?
We are well aware of the importance of delivery time to you, so we are all cooperative logistics companies with fast and safe transportation.
We have another supplier, why did we choose you?
We believe that our products and services can provide unique value to your business, and we are happy to discuss how to differentiate ourselves from other suppliers in the market
Do you have any other product recommendations?
We specialize in processing metal parts such as tantalum, niobium, vanadium, hafnium, tungsten, zirconium, titanium, etc., with sufficient inventory and short construction period.

 

Contact Us

 

 

With the rapid development of modern technology, high-purity vanadium sputtering targets are becoming increasingly important in the semiconductor and display industries. Yusheng Metal is a leading manufacturer of high-purity vanadium sputtering targets. They meet the demanding requirements of the industry and are committed to providing customers with high-quality products.

product-3584-1189

    Sales Manager

   Contact: Kelly

Our address

Wenquan village Industrial Zone, Gaoxin Development Zone, Baoji City, Shaanxi Province, China

Phone Number/Whatsapp

+86 13379388917

E-mail

kd@tantalumysjs.com

product-554-449

 

 

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