Vanadium Sputtering Target

The properties of the source material are shared by the vanadium(V) sputtering target. Chemical element vanadium has the atomic number 23 and the letter V in its symbol. It is a transition metal that is hard, silvery-grey, ductile, and malleable. Rarely occurring in nature, the elemental metal is partially stabilized against further oxidation after being artificially extracted. This process is called passivation.Vanadium is tougher than most metals and steel and is thermally and electrically insulating. It has strong corrosion resistance and maintains its stability when exposed to alkalis, sulfuric, and hydrochloric acids. Although an oxide passivation layer forms even at ambient temperature, it is oxidized in air at about 933 K (660 °C, 1220 °F).

Melting method is used to manufacture vanadium sputtering targets. Vanadium oxide can be used for Infrared intelligent windows, electro-optic switch devices, laser protection materials, and stealth materials due to its unique optical and electric capabilities. End users can obtain constant erosion rates and high pure and homogeneous thin film coating during PVD process with up to 3N purity and unique annealing treatment, uniform grain size, and decreased gas content.

With the help of our high purity sputtering target, we can increase the electrical conductivity of the film and reduce particle formation during the PVD process.

Analytical Techniques: 1. GDMS and ICP-OES were used to examine metallic elements.
2. LECO examined the components of gas.

Vanadium sputtering target preparation procedure Materials - EB Measurement, Cleaning, Inspection, Annealing, Micrograph, Machining, Forging, Rolling, Package

Series of vanadium alloy sputtering targets
Cobalt vanadium, iron vanadium, nickel vanadium alloy targets, aluminum molybdenum, aluminum tin titanium vanadium, etc.

sequence of vanadium compounds
Vanadium compounds include, among others, vanadium pentoxide, vanadium nitride, vanadium boride, and vanadium carbide.

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