Baoji Yusheng Metal Technology Co., Ltd. specializes in the research and production of tantalum sputtering targets and vacuum coating materials. Since tantalum has the ability to form oxide films and has a protective effect, tantalum targets are widely used as substrates for the manufacture of electrolytic capacitors. This time, the application of tantalum sputtering targets in the field of microelectronics was introduced.
Tantalum Targets for Thermal Inkjet Printhead Applications
Thermal inkjet printheads can be used in the fabrication of thin film integrated circuits, which facilitates the use of tantalum targets. In the manufacturing process of integrated circuits, thin film resistors are used to rapidly heat the film layer of the ink with an energy density close to 1.28E9 watts/m2, so that some extremely small inks evaporate to form extended bubbles, which are actually small ink droplets ejected. . Since high-temperature inks can cause cavitation in some inkjet printing equipment, the use of tantalum anti-cavitation films can protect ink installations.
Tantalum Targets for Copper Plating
Tantalum thin films have obvious advantages in the manufacturing process of integrated circuits. One of the major advancements in the use of tantalum sputtering targets is the application of copper plating. Photoresist masks and plasma etching techniques cannot be used to form copper because copper is under low-temperature plasma etching conditions. The desired volatile constituents are not formed. In general, the high conductivity of copper materials makes it necessary for the barrier film to completely isolate the copper. However, if the barrier film is too thick, the high conductivity advantages of copper interconnects are lost. Therefore, it is important that the deposition of the barrier film in the copper plating scheme has good step coverage and reduced protrusions at the via/trench voids. In replacing 0.10um copper ICs, tantalum and nitric oxide PVD barrier films show some unique advantages, such as good copper diffusion and good adhesion to electrolytes and copper.
The 99.98% tantalum targets produced by Baoji Yusheng Metal Technology Co., Ltd. are often used as heating parts, heat insulation parts, and charging containers for vacuum blast furnaces. The tantalum targets produced by our company cannot be used as substrates in the chemical industry. , aerospace industry, medical equipment, and other fields.
