99.99% Tantalum Oxide
Physical and chemical properties of 99.99% tantalum oxide
Density | 8.2 g/mL at 25 °C (lit.) |
Melting point | 1872 °C |
Purity | 99.99% |
Molecular formula | O5Ta2 |
Molecular weight | 441.89300 |
PSA | 77.51000 |
Specification | 5μm or produced to customer requirements. |
Appearance | White to white - beige powder |
Storage conditions | Keep the receptacle sealed, store it in a cool, dry place and ensure good ventilation or exhaust in the workroom |
Stability | No decomposition if used and stored according to specifications, no known hazardous reactions, avoid oxides. Insoluble in water. Insoluble in almost all acids except hydrofluoric acid. Eutectic fusion with potassium bisulphate, with alkali metal hydroxides, or with alkali metal carbonates gives tantalates equivalent to various metals, respectively. Tantalates are generally easily hydrolyzed and are completely decomposed by the action of strong inorganic acids, resulting in a white colloidal tantalate precipitate. When the tantalic acid is completely dehydrated, tantalum pentoxide is obtained. |
99.99%Tantalum oxide specifications and packaging:
1、We can process and order different specifications according to users' requirements.
2、Packaging: wooden box or according to the user's requirements, divided into bags and barrels.
99.99% Tantalum oxide applications:
Mainly used for coated materials, electro-optics. The evaporation temperature is 1920°C under a vacuum of 10-2 Pa. It can be heated by tantalum, tungsten boats, and coils for evaporation, or by tungsten crucibles for evaporation, with good results with electron beam heating. Tantalum oxide films have a transparent zone of 0.3 to 10 μm and a refractive index of n=2.25 (λ=0.4 μm) and n=2.1 (λ=0.55 μm, Ts=250°C). Ta2O5 coatings can be used as a high refractive index film material in interference coatings, and their mechanical properties are extremely strong and strong alkalis do not corrode them. It can also be used as a protective coating, especially for applications in high-temperature environments.
Thin films can be prepared by applying various methods such as thermal oxidation, electron beam evaporation, DC sputtering, reactive magnetron DC sputtering, RF sputtering, reactive sputtering, reactive RF sputtering, ion beam sputtering, ion plating, ion-assisted precipitation, and anodic oxidation.
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