Titanium Sputtering Targets

What are targets for titanium sputtering?
It is crucial to initially comprehend titanium in order to comprehend titanium sputtering targets.

Metal element titanium is renowned for its sturdiness and durability. It is valuable as a refractory metal due to its comparatively high melting point (more than 1,650°C or 3,000°F). Sputter coating is a method that employs titanium  targets, which are constructed from titanium metal.

Casting and melting are the two basic processes used to create titanium targets.

When a metal melts, a high temperature is used to cause it to turn liquid. A target is produced once it is put into a mold and given time to cool.

Casting: High-energy particles are fired at the metal inside of a vacuum chamber. The metal vaporizes as a result, condensing on the target's surface when it cools.

Titanium (Ti) Specifications

One of the key components in creating integrated circuits, its purity often demands more than 99.99%. For the semiconductor and solar industries, AEM provides titanium alloy targets like Tungsten Titanium (W/Ti 90/10 wt%) Sputtering Target. The target density for W/Ti sputtering can exceed 14.24 g/cm3, and the purity can approach 99.995%.

The ductile and strong metal titanium has a low density (especially in an oxygen-free environment). It is valuable as a refractory metal due to its comparatively high melting point (more than 1,650°C or 3,000°F). It has a low electrical and thermal conductivity and is paramagnetic. Hardware tool coating, ornamental coating, coating of semiconductor components, and coating of flat displays are all frequent uses for titanium sputtering targets. One of the key components in creating integrated circuits, its purity often demands more than 99.99%. For the semiconductor and solar industries, AEM provides titanium alloy targets like Tungsten Titanium (W/Ti 90/10 wt%) Sputtering Target. The target density for W/Ti sputtering can exceed 14.24 g/cm3, and the purity can approach 99.995%.

Uses include flat panel displays, decorative coatings for hardware tools, and semiconductors.

Features: Low cost; high purity; refined grain; engineered microstructure; average grain size of 20 um; semiconductor grade.

On our website, we provide a broad selection of sputtering targets, evaporation sources, and other deposition materials, organized by substance. Please go here to request an estimate for sputtering targets and other deposition products that aren't listed or to speak with someone directly about current prices.zy@tantalumysjs.com

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