Hafnium Targets

Name: Customized Hafnium Targets Suppliers, Manufacturers, Factory - High Quality - Yusheng Metal
Brand: Yusheng
SKU: 237449259

Hafnium targets are made of high purity hafnium metal and have good thermal conductivity, mechanical strength and chemical stability. Hafnium targets are widely used in physical evaporation deposition, magnetron sputtering and other technologies for the preparation of a variety of thin film materials, such as oxides, nitrides, silicides and metals. In semiconductor manufacturing, hafnium targets are commonly used to prepare thin film materials such as silicon, silicon nitride, alumina and zirconia. These thin film materials play an important role in semiconductor devices, such as improving device stability and performance. In display manufacturing, hafnium targets are commonly used to prepare transparent electrode materials such as indium tin oxide (ITO) and zinc oxide (ZnO). Hafnium targets play an important role in semiconductor and display manufacturing due to their high purity and good properties. Demand for hafnium targets will continue to grow as the industry develops.

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Product Introduction

Hafnium target preparation process

Preparation of hafnium metal: Hafnium metal is the raw material of hafnium target material, which needs to be prepared by reducing hafnium tetrachloride or hafnium fluoride. Processing of hafnium metal: Hafnium metal is processed into the required shape and size, usually by forging, stretching, cutting and other processing methods. Cleaning of hafnium target material: Clean the impurities and oxides on the surface of hafnium target material to ensure the purity of the material.

Processing and testing of hafnium target material: Melt the crystallized hafnium bar into ingot, and then process the ingot into the target material of the required shape and size, and then strictly test the purity and grain size to ensure that the quality of hafnium target material meets the requirements. The above are the main steps in the preparation of hafnium target material. The preparation process of different manufacturers may be different, but generally it is based on the above steps.

Characteristics of hafnium targets

Hafnium target shape	flat target, special-shaped customization
Hafnium target purity	99.95%
brand	Yusheng Metal
Trademark	Hf1
Origin	Baoji China
Hafnium target size	processed according to drawings or customized by others

Our Products

Hafnium target

Hafnium alloy

Hafnium target

Yusheng Metal's conventional product specifications:
a. Hafnium particles (crystalline hafnium) diameter 2* (2.5-5mm), of which Zr≤1.5%

b. Hafnium particles (low zirconium hafnium) conventional purity ≥99.95%, of which Zr<0.5%

c. Hafnium particles (sponge hafnium) conventional purity ≥99.4%, of which Zr<2%

d. Hafnium target material purity ≥99.9% (including zirconium), purity ≥99.95% (including zirconium), specifications and sizes: round target, square target, tube target, etc. (size can be customized)

e. Hafnium powder purity ≥99.9% (including zirconium), purity ≥99.95% (including zirconium), size: -300 mesh.

Baoji Yusheng Metal Technology Co., Ltd. focuses on the research and development and production of high-purity coating sputtering targets and high-purity coating film materials.
With more than ten years of experience in material research and development and application, combined with the most advanced production equipment, it can provide metal targets and film materials, high-purity alloy targets and film materials.

Products mainly including various evaporation coating crucibles and evaporation boats and other accessories will be widely used in the fields of semiconductors, precision optics, laser infrared, thin-film solar energy, touch display, functional glass, surface coating, etc. All major companies and scientific research institutions are welcome to work together and cooperate with each other to provide one-stop coating material solutions and provide material technical support. If you have any needs, please call directly: