
Niobium Sputtering Target Manufacturers
Production process
1. Raw material selection: Using high-purity niobium metal blocks as raw materials, ensuring the purity and quality of the raw materials is the basis for the subsequent production of high-quality niobium targets.
2. Melting: The niobium raw materials are melted by vacuum arc melting, electron beam melting and other methods. Vacuum arc melting can use the high temperature generated by the arc to quickly melt the niobium raw material and remove impurities in a high vacuum environment; electron beam melting uses a high-energy electron beam to bombard the niobium raw material to melt it. This method can more accurately control the melting process and temperature.
3. Casting: The smelted niobium liquid is introduced into a pre-designed mold, solidified under specific cooling conditions, and cooled and solidified to form a niobium ingot
4. Forging: The niobium ingot is forged and external force is applied to cause plastic deformation.
5. Subsequent processing: The niobium material after forging may also need to be pickled, vacuum annealed and other treatments to remove the surface oxide scale and eliminate processing stress, and finally mechanically processed to obtain the finished niobium target material.
Product details
| Product name | Niobium targets |
| Grade | R04200 |
| Purity | ≥99.95% |
| Standard | ASTM B393-05 |
| Process | magnetron sputtering principle |
| Type | flat target, rotating target, customized target |
| Production process | hot rolling, cold rolling, alkali washing, shearing |
| Application fields | microelectronics, silicon wafer manufacturing, flat panel display, storage technology |
| Special recommendation | The company has many years of experience in the production of coating targets and can produce tantalum, niobium, vanadium, zirconium, hafnium, tungsten, molybdenum, titanium, nickel and their high-purity metal processing parts. |
Main applications of niobium targets
1. Semiconductor field
Niobium targets can be used to manufacture semiconductor devices such as transistors and flat panel displays, and integrated circuits. Metallic niobium has good chemical stability and conductivity, and can play a good conductive role in the semiconductor manufacturing process to ensure the stability and reliability of the device.
2. Coating field
Niobium targets can be used as PVD (physical vapor deposition) coating materials for surface treatment of metals, ceramics and other materials to form a wear-resistant and corrosion-resistant protective layer. Niobium products show good film-forming properties and chemical stability during the coating process, which can improve the hardness, adhesion and corrosion resistance of the coating.
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