Tungsten Target

Tungsten target material, the chemical element symbol of tungsten is W, the atomic number is 74, the relative atomic mass is 183.85, the atomic radius is 137 picometers, the density is 19.35 grams per cubic centimeter, belongs to the VIB group of the sixth period (the second longest period) in the periodic table of elements. The ionic radius of tungsten is 0.68×10-10 m. Because of the small radius of W6+ ion, high electric value and strong polarization ability, tungsten is mainly in the form of complex anion [WO4]2-, which combines with Fe2+, Mn2+, Ca2+ and other cations in the solution to form wolframite or scheelite precipitates. After smelting, tungsten is a silvery-white lustrous metal with a very high melting point, great hardness, low vapor pressure, small evaporation rate, and chemical stability. Tungsten can be used in the manufacture of firearms, rocket propulsion nozzles, cutting metal blades, drills, superhard dies, wire drawing dies, etc. It has a wide range of uses. The most important of the alloy system state is alloy steel, various forged parts of pure tungsten are used in the production of electronic tubes, radio electronics and X-ray technology, and compounds are mainly used in the production of certain types of lacquers and pigments, inks, electroplating, etc. It is also used as a catalyst, etc.

We produce high purity sputtering targets, whose most important benefit is to obtain films with excellent electrical conductivity and particle minimization during physical vapor deposition. The following table shows the certificate of analysis of the composition of 3N5 high purity tungsten sputtering targets. Analysis methods used: 1, metal element analysis using ICP-OES; 2, gas element analysis using LECO.

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