Zirconium Sputtering Target
2.Product Name：Zirconium sputtering target
3.Element Symbol：Zr
4.Purity：2N5,3N5
5.Shape：Planar target, rotating target
Similar characteristics apply to the properties of zirconium sputtering targets. Its melting point is 1852°C, density is 6.49g/cc, and vapor pressure at 1987°C is 10 -4 Torr. It is a strong transition metal that is glossy, off-white, and similar to titanium and hafnium to a lesser extent. Zirconium is mostly employed as an opacifier and refractory material, but due to its high corrosion resistance, a tiny quantity of zirconium is also utilized as an alloying agent.
Zirconium Sputtering Target Properties (Theoretical)
| Molecular Weight | 91.22 |
|---|---|
| Appearance | Gray metal |
| Melting Point | 1852 °C |
| Boiling Point | 3580 °C |
| Density | 6506 kg/m3 |
| Solubility in H2O | N/A |
| Resistance to Electricity | at 20 oC °C, 40.0 microhm-cm |
| Electronegativity | 1.4 Paulings |
| Poisson's Ratio | 0.34 |
| Specific Heat | 0.0671 Cal/g/K @ 25 oC °C |
| Tensile Strength | 230 MPa |
| Thermal Conductivity | 0.227 W/cm/K @ 298.2 K |
| Thermal Expansion | (25 °C) 5.7 µm·m-1·K-1 |
| Vickers Hardness | 903 MPa |
| Young's Modulus | 88 GPa |
Zirconium sputtering targets are made using a melting process and are typically used for optical and ornamental coating. We provide standard Hf and Zr targets for Leybold coating equipment, which are high pure Targets with very little Hafnium.
While zirconium arc cathodes and sputtering targets of lower purity are utilized to create gold-colored films. End users can achieve good hardness, high brightness, corrosion and oxidation resistant color that won't discolor or tarnish for a very long period with up to 99.4% purity, consistent grain size, and decreased impurity content. For producers of watches, sanitary ware, vehicle mirrors, etc., we have been delivering zirconium targets or zirconium arc cathodes that are appropriate for various magnetron sputtering machines and ion plating machines.
The usual Certificate of Analysis for 3N5 Zirconium Sputtering Target is provided below.
Analytical Techniques:
1. ICP-OES was used to examine metallic elements;
2. LECO was used to study gas elements.
For semiconductor, chemical vapour deposition (CVD), physical vapour deposition (PVD), display, and optical applications, Yusheng Metals specializes in high purity zirconium sputtering targets with the highest density and smallest average grain size.We offer flat targets in sizes and configurations up to 820 mm, in monolithic and bonded variants, with hole drilling positions and designs for threads, bevels, recesses, and backsheets. These targets can be used with both older and more modern sputtering apparatus, including flip-chips and big area coatings for fuel or solar cells. Additionally, unique sizes and alloys, as well as research objectives, are manufactured.
Hot Tags: zirconium sputtering target, suppliers, manufacturers, factory, customized, buy, price, quotation, quality, for sale, in stock
Previous
Zirconium Rotatable TargetNext
Zirconium TargetYou Might Also Like
Send Inquiry