Zirconium Target

Zirconium (Zr) sputtering targets have the same properties as their raw materials. It has a density of 6.49 g / cc, a melting point of 1852°C, and a vapor pressure of 10 -4 Torr at 1987°C. It is a lustrous, off-white, strong transition metal, very similar to hafnium and to a lesser extent to titanium. Zirconium is used primarily as a refractory and emulsion, but small amounts are used as an alloying agent because of its high corrosion resistance. Zirconium sputtering targets are widely used in decorative coatings, semiconductor and optical coatings.

Zirconium target preparation process：

Material Preparation - Electron Beam Melting - Chemical Analysis - Forging - Rolling - Annealing - Metallographic Testing - Machining - Dimensional Testing - Cleaning - Final Inspection - Packaging

Applications of zirconium sputtering targets：

Widely used in thin film deposition, fuel cells, decoration, semiconductor, display, LED and photovoltaic devices, optical information storage space industry such as functional coating, glass coating industry such as automotive glass and architectural glass, optical communication, etc.

Other applications of zirconium metal：

This metal is also used in the nuclear industry as a cladding fuel element in nuclear reactors because of its low absorption cross section for neutrons. Zirconium is highly resistant to many common acids, alkalis and seawater. Therefore, it is widely used in the chemical industry where corrosives are used. The metal is used as an alloying agent in steel and also in the manufacture of surgical instruments. Metallic superconductors at low temperatures and zirconium-niobium alloys are used to make superconductor magnets. Alloys containing zinc are magnetic at temperatures below 35 K. Zirconium is used as an "aspirant" in vacuum tubes, photographic flashes, explosive primers and filaments.

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