Niobium Oxide Targets

At present, the preparation of niobium oxide targets mainly adopts a hot pressing sintering process, but the shortcomings of poor compactness and conductivity are generally prepared, which is difficult to meet the requirements of DC magnetron sputtering for target materials. In addition, the hot pressing sintering process has a long sintering time, high energy consumption, and high cost. Based on this, it is necessary to provide a Niniobium oxide target with low energy consumption, low cost, good compactness and conductivity, and preparation method thereof.

The following steps are included:

Niobium pentoxide powder and niobium powder were mixed evenly, and calcined at 600~800 °C for 0.5~3h under an oxygen atmosphere or air atmosphere to obtain a pretreated powder;

The powder is sintered in a graphite mold at 900~1200 °C under a protective gas atmosphere for 0.5~1h to obtain a niobium oxide target.

The preparation method of the above niobium oxide targets, after the niobium pentoxide powder and niobium powder, are mixed evenly, the oxidizing calcination treatment is carried out, and the surface of the niobium powder is oxidized to form an activated oxide film barrier, so as to disperse the niobium pentoxide powder, avoid the phenomenon of agglomeration caused by local sintering of niobium pentoxide powder, and the obtained pretreated powder is not agglomerated, non-bonded, has good fluidity and concentrated particle size distribution. Among them, the niobium pentoxide powder has a high specific surface area, and high activity, and its particle size is small, which in turn reduces the temperature of hot pressing sintering and reduces the time of hot press sintering, thereby reducing the energy consumption and cost of hot press sintering, shortening the production cycle and effectively improving the densification degree of niobium oxide target obtained by hot press sintering.

The chemical formula of the niobium oxide target prepared by the above preparation method is Nb2Ox, 4.0≤x≤4.9, the target has high compactness, low porosity, and a flat surface without pits, and its density is as high as 4.57g/cm3. Its conductivity is high, and the resistivity is 2×10-3~8×10-3Ω·cm. Among them, the relative density refers to the ratio of the density measured by the Archimedes drainage method solid density detector to the theoretical density, and the magnitude of the relative density indicates the degree of densification of the material, and the greater the relative density, the higher the degree of densification of the material.

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