Planar Niobium Target

Sputtering targets require homogeneous composition, suitable particle size, and specific crystallographic orientation, and the high requirements of these sputtering targets are all aimed at achieving a uniform film deposition rate over the entire substrate. Niobium targets are mainly used in surface engineering materials, such as marine, chemical, and liquid crystal display, and coating industries such as heat resistance, corrosion resistance, and high conductivity. A flat niobium target is a niobium target with a diameter greater than or equal to 150mm, which is usually called a bare target, and the user first welds it with a copper or aluminum back target when using it, and then sputters to deposit niobium atoms on the substrate material to achieve sputtering coating. In order to achieve the uniformity of the coating, the planar niobium target needs to crush the niobium ingot casting crystals to ensure that the internal structure of the niobium target is completely recrystallized, the grain size is less than 100 μπι, and it is uniform.

Our company provides a new preparation method, including the following steps: the niobium ingots are forged radially and squarely lengthened, the forged niobium ingots are pickled, and the pickled niobium ingots are heat treated; Then the niobium ingots are flattened and forged, the forged niobium ingots are pickled, and the pickled niobium ingots are heat treated; Finally, the niobium ingots are rolled to obtain a planar niobium target.

In the process of preparing a niobium target, the forging process is a combination of radial square, axial lengthening, and flattening forging, so that the columnar crystal region in the niobium ingot, the central equiaxed crystal region, and the vicinity of the edge of the niobium ingot, the metal flow of the central part of the blank increases, the unevenness of the central structure is significantly improved, and the original cast coarse crystal structure is fully broken in multiple directions under multi-directional force, thereby promoting the niobium ingot to obtain a relatively uniform grain structure. It avoids the presence of harmful tissues such as "crystal band" tissue and coarse crystalline tissue left behind by the central part without effective fragmentation; In the rolling stage, the deformation of niobium ingots is more uniform, and after processing, with the intermediate heat treatment process, the structure of the niobium target material is more and more homogeneous and refined, and finally, an equiaxed crystalline structure planar niobium target with a uniform structure and grain size of less than 100 μ m is obtained. Therefore, an equiaxed crystal structure with uniform tissue and grain size of fewer than 100 μπι was obtained by this preparation method.

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