High-Purity Niobium Targets

Niobium is an off-white metal with a melting point of 2468 °C, a boiling point of 4742 °C and a density of 8.57 g/cm³. Niobium is a lustrous gray metal that is paramagnetic and belongs to group 5 on the periodic table. High-purity niobium metal is very malleable, but as the impurity content rises, it becomes harder.Niobium has a low capture cross-section for thermal neutrons and is therefore of considerable use in the nuclear industry.

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Product Introduction

Grades: R04200, R04210

Purity: ≥99.95%, 99.99%

Standard: ASTM B393

Density : 8.57g/cm3

Product Description: Application: Superconducting Industry For the production of niobium foil Heat shield in high-temperature furnace For the production of niobium welded pipes For the production of human implants.

Status: hard, soft

Niobium target process: cold rolling, pickling, shearing

Product Application:

The niobium target material is important to thin film material. The final purity of the niobium target material can reach more than 99.95%, the grain size is small, the recrystallization structure is good, and the triaxial consistency is good. As a cathodic sputtering target, the oxide film it forms is of uniform quality, will not react with other substances in the air, and has a long-lasting protective effect. Niobium sputtering targets are widely used in optical fibers, semiconductor chips, and integrated circuits.

Specifications: diameter (50-400)mm * thickness (3-28) mm

Purity: 99.9%　

Chemical Composition（％）
Grade	Main Ingredients	Impurity Content（≤）
Nb	Fe	Si	Ni	W	Mo	Ti	Ta	O	C	H	N
Nb1	Bal	0.004	0.004	0.002	0.005	0.005	0.002	0.05	0.012	0.0035	0.0012	0.003
Nb2	Bal	0.01	0.01	0.005	0.02	0.01	0.004	0.07	0.015	0.0050	0.0015	0.008

thickness	Thickness tolerances	width	Width tolerances	length	Length tolerances
0.1~0.2	±0.015	20～1000	±2.0	20～2000	±2.0
0.2～0.3	±0.02	20～1000	±2.0	20～2000	±2.0
0.3～0.5	±0.03	20～1000	±2.0	20～2000	±2.0
0.5～0.8	±0.04	20～1000	±2.0	20～2000	±2.0
0.8～1.0	±0.06	20～1000	±2.0	20～2000	±2.0
1.0～1.5	±0.08	20～1000	±1.0	20～2000	±1.0
1.5～2.0	±0.10	20～1000	±1.0	20～2000	±1.0
2.0～3.0	±0.12	20～1000	±1.0	20～2000	±1.0
3.0～5.0	±0.15	20～1000	±1.0	20～2000	±1.0
5.0～8.0	±0.18	20～1000	±1.0	20～2000	±1.0
8.0～12.0	±0.20	20～1000	±1.0	20～2000	±1.0
12.0～15.0	±0.50	20～1000	±1.0	20～2000	±1.0
15.0～2.0	±0.80	20～1000	±1.0	20～2000	±1.0

The most important benefit of our high-purity niobium targets is that they obtain films with excellent conductivity and particle minimization during physical vapor deposition. The following table is a certificate of compositional analysis for 3N5 high-purity niobium targets. The analysis methods adopted: 1. the use of ICP-OES to analyze metal elements; 2. Use LECO for gas element analysis.

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