Sputtering Tantalum Targets

Name: Customized Sputtering Tantalum Targets Suppliers, Manufacturers, Factory - High Quality - Yusheng Metal
Brand: Yusheng
SKU: 180818379

The target material is the target material for high-speed charge energy particle bombardment. By replacing different target materials (such as aluminum, copper, stainless steel, titanium, nickel target, etc.), different film systems can be obtained (such as super hard, wear-resistant, anti-corrosion alloy film, etc.). Tantalum sputtering target is mainly used in electronics and information industry, such as integrated circuits, information storage, liquid crystal display, laser memory, electronic control devices, etc.; it can also be used in the field of glass coating; it can also be applied to wear-resistant materials, high-temperature corrosion resistance, high-grade decorative supplies, and other industries.

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Product Introduction

Sputtered tantalum targets can be divided into square targets, round targets, and shaped targets according to their shape. Magnetron sputtering is a new physical vapor phase coating method that has considerable advantages over evaporative coating methods in many respects. As a mature technology, magnetron sputtering has been applied to many fields. It uses ions generated by an ion source, which are accelerated and gathered in a vacuum to form a high-speed energy ion beam that bombards a solid surface, where the ions and the atoms on the solid surface exchange kinetic energy, causing the atoms on the solid surface to leave the solid and deposit on the substrate surface.

Various types of sputtered thin film materials are widely used for semiconductor integrated circuits, solar photovoltaics, recording media, flat panel displays, and workpiece surface coatings. Copper targets - conductive layers, high purity copper materials are used in large quantities as wiring materials in the sub 110 nm part of the technology because of their very low resistance, which is very effective against improving chip integration.

Product Details

Brand	Yusheng Metal
Product name	Tantalum Sputtering Target
Purity	99.95%
Density	95-99%
Specification	Length<300 mm ; Width<300 mm Diameter<300 mm; Thickness<1 mm
Tolerance	±0.1mm
Surface	3.2Ra
MOQ	1KG

Our Sputtering Tantalum Targets

Baoji Yusheng Metal Technology Co., Ltd.

Tantalum target application

Capacitors
About half of the tantalum consumed each year is used in the electronics industry, mainly as powder and wires for capacitors. Tantalum capacitors are favored in space-sensitive high-end applications such as telecommunications, data storage and implantable medical devices.

Engine turbine blades
The metal's high melting point and corrosion resistance make it suitable for alloying applications. Tantalum is also used as an additive to nickel-based high-temperature alloys, and its main application is turbine blades for aircraft engines and land-based gas turbines.

Chemical Processing Equipment
Tantalum's high corrosion resistance and high temperature resistance make the metal an ideal structural material for containers, pipes, valves and heat exchanger linings in the chemical and pharmaceutical industries.

Tantalum Target Alloy Series
In addition to tantalum targets, we can also provide sputtering targets such as tantalum silicon alloy, tantalum aluminum alloy, tantalum tungsten alloy, nickel tantalum alloy, cobalt zirconium tantalum alloy, tantalum nitride, tantalum carbide, tantalum boride, tantalum pentoxide, etc.

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If your project happens to require tantalum targets or other performance materials of tantalum alloys, please contact us and we will give you a quote and answer your questions within 24 hours!