Tantalum Target 3N5

Tantalum target, tantalum chemical symbol Ta, steel gray metal, in the periodic table of VB group, atomic number 73, atomic weight 180.9479, body center cubic crystal, common valence is +5. The hardness of tantalum is low and related to the oxygen content, ordinary pure tantalum, annealed Vickers hardness is only 140HV. It has a melting point of up to 2995 °C, ranking fifth among elementals after carbon, tungsten, rhenium, and osmium. 

Tantalum is malleable and can be drawn into filament to make thin foil. Its coefficient of thermal expansion is small. For every degree Celsius rise, it only expands by 6.6 parts per million. It is also much more durable than copper. High-purity tantalum can be used as a solid electrolytic capacitor with large capacity, small size, and stable performance, used in radar, missiles, supersonic aircraft, and electronic computers, tantalum can also manufacture petrochemical heat exchangers, heaters, concentrators, and reactors tanks, towers, pipelines, and valves. 

Tantalum can also be used as an electronic transmitter tube and high-power tube parts materials, tantalum alloy can be used as a supersonic aircraft combustion chamber and heat-resistant and high-strength materials, tantalum tungsten alloy missile nozzle, tantalum carbide can be used alone or together with other carbon compounds, as a forging die, cutting tool, jet engine turbine blades, valves, and rocket nozzle coating. 

Tantalum carbide is widely used in the manufacture of cemented carbide. Tantalum also has stability and healing properties with human tissues, and can be used as a surgical complement and artificial bone, as well as bone plates, screws, and suture needles.

The figure below is a picture of micrometallographic detection of a tantalum sputtering target, with an average particle size of < 100um.

We produce tantalum targets 3N5, the most important benefit of which is the ability to obtain films with excellent conductivity and particle minimization during physical vapor deposition. The following table is the composition analysis certificate of tantalum target 3N5.  The analysis methods adopted: 1, the use of ICP-OES to analyze metal elements; 2. Use LECO for gas element analysis.

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