Niobium Sputtering Targets

Niobium Sputtering Targets

1.Material Type:Niobium
2.Symbol:Nb
3.Atomic Weight:92.90638
4.Atomic Number:41
5.Z Ratio:0.492
6.Sputter:DC
7.Max Power Density*(Watts/Square Inch):100
8.Type of Bond:Indium, Elastomer
9.Comments:Attacks W source.
10.Color/Appearance:Gray, Metallic
11.Thermal Conductivity:54 W/m.K
12.Melting Point (°C):2,468
13.Coefficient of Thermal Expansion:7.3 x 10-6/K
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Product Introduction

The periodic table's group 5 metal, niobium, is a glossy, grey, ductile, paramagnetic metal (see table), with an unusual configuration of electrons in its outermost shells. (This is seen in the vicinity of palladium (45), rhodium (45), and ruthenium (44) (46). From T = 0 K to its melting point, it is believed to have a body-centered cubic crystal structure. The thermal expansion along the three crystallographic axes has been measured with high resolution, and the results show anisotropies that are not consistent with a cubic structure. Hence, more study in this area is anticipated.

Details about Niobium Sputtering Targets
Purity: 99.95%;

Circular: Diameter: 16 Inches; Block: Length: 32 Inches; Width: 12 Inches; Thickness: 1mm;

Type of Targets: Planar Sputtering Target, Rotary Sputtering Target.

4Uses for Niobium Sputtering Targets include: architectural glass, fiber optics, optical flims, and wear coatings.
Features: Good purity; refined grains (average grain size around 40 um)

Method of Manufacturing 

1.Refining
Many steps of electron beam melting are followed by rolling and annealing, cleaning, and final packing.
protection against environmental toxins
safeguarding during shipping
2.Options
Sputtering target bonding service; 99.95% minimum purity; smaller sizes also offered for R&D applications


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Crucibles
N/A
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High quality Niobium sputtering targets with the highest density are a specialty of Yusheng Metal. For usage in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD), display, and optical applications, Niobium (Nb) sputtering targets with the highest purity (99.999%) and smallest average grain sizes are available. With planar target dimensions and configurations up to 820 mm, our industry-standard sputtering targets for thin film are available as monoblock or bonded products. They feature hole drill locations, threading, beveling, grooves, and backing that are designed to work with both traditional sputtering devices and cutting-edge process equipment, such as large-area coating for solar energy or fuel cells and flip-chip applications. Moreover, custom sizes and metals are made along with research-sized targets.The most effective methodologies, such as X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma, are used to assess all targets (ICP). "Sputtering" is the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment, Aside from targets of almost any size that are rectangular, circular, or oval, we can also offer targets outside of this range.

Crystallization, solid state, and other ultra high purification procedures like sublimation are used to make materials. American Elements specializes in creating unique compositions for use in business, academia, and innovative, exclusive technology.Yusheng Metal specializes in creating unique compositions for industrial, academic, and proprietary uses.Moreover, Yusheng Metal can cast any rare earth metal and the majority of other cutting-edge materials into rod, bar, or plate form, as well as into various machined shapes and using other techniques like nanoparticles, solutions, and organometallics. In addition to producing rod, disc, granules, ingots, pellets, and bits, we also make niobium. By request, additional shapes are available.

Niobium Sputtering Targets use

 

 

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