Ta Sputter Target
2.Grade:R05200 R05400 R05252 (Ta-2.5W) R05255 (Ta-10W)
3.Purity:≥99.95% (Maximum 99.99%)
4.Recrystalize: Minimum 95%
5.Grain Size:Minimum 40um
6.Surface Roughness:Maximum Ra0.4
7.Flatness:0.1mm or maximum 0.10%
8.Tolerance:Diameter +/-0.254mm
Yusheng metal tantalum sputtering target production process
Yusheng Metal's tantalum sputtering target products are processed from tantalum ingots using EB electron bombardment, rolling, and annealing processes. The targets made by this process have uniform crystal structure, texture, and energy distribution, and the internal structure good.
In recent years, the scale of the IC (integrated circuit) industry has continued to expand, and chip process technology has also developed in the direction of high density. Tantalum is often used as a sputter coating material for the diffusion barrier layer in the copper connection process because of its strong chemical stability. The uniform microstructure of tantalum sputtering targets has a direct impact on sputtering performance.
Tantalum targets require fine and uniform grains, randomly dispersed grain orientation, and excellent film manufacturing performance. However, due to the properties of tantalum, a microstructure can easily form during cold working with a core orientation of 111 (111>/ND) and a surface orientation of 100 (100>/ND). When manufacturing thin films, the sputtering rate changes depending on the target thickness, which affects the stability of the sputtering process.
Ta sputtering target principle
Tantalum is often used in the production of electrolytic capacitors due to its ability to form thin oxides and the protective nature of the oxide layer. Evaporation was used in the early stages of tantalum deposition, but as physical vapor deposition techniques such as sputter coating emerged in the late 1960s as superior methods for thin film deposition, they replaced evaporation.
In the physical vapor deposition process, ionized argon atoms use electromagnetic mechanics to impact the target, knocking down the metal target atoms, and the metal target atoms are deposited on the substrate to form a thin film.
Yusheng metal production equipment
Yusheng Metal has a complete set of scientific research, production, testing, sales and service systems from smelting, forging, hot rolling, cold rolling, finishing to finished materials. It has a 350KW electronic east bombardment furnace, a 2000T hydraulic press, a 1700mm vacuum annealing furnace, and a One 42KW and two 15KW precision forging machines, 14 finishing strip mills, LDD120, LDD-40, LDD-15, LDD-8 double-line pipe rolling mill, 2-roll 500T blanking mill, 4 cold rolling mills, 6 cold rolling mills Machine, 15KW double-sided wire drawing machine, cylindrical grinder, peeling machine, surface grinder and a series of equipment.
Application of tantalum sputtering target
The tantalum sputtering target material is made of pressure-processed tantalum sheets and has the characteristics of high purity, fine grains, good recrystallization structure, and good three-axis consistency.
Tantalum sputtering targets are widely used in the optoelectronic and semiconductor industries. They are mainly used for sputtering deposition of cathode sputtering coatings, high vacuum suction active materials, optical fibers, semiconductor wafers, integrated circuits, etc. They are an important part of thin film technology.
Baoji Yusheng Metal Technology Co., Ltd. is a global supplier of rare gold tantalum, niobium, vanadium, zirconium and hafnium processing parts. It mainly produces wires, rods, plates, tubes, rings, crucibles, etc. and other non-standard special processing parts. We will regularly release information related to our company's products and materials disciplines, covering the entire chain of materials technology research and development, industrialization of material achievements, application and promotion of material products, materials industry agglomeration, and materials industry ecology. You are welcome to contact us at any time.
Contact us
Sales Manager:
Contact: Li Fengwu
Email: kd@tantalumysjs.com
Tel: 13379388917
Fax: 0917-3139100
Post code: 721013
Web:https://www.tantalumysjs.com/
Add：Wenquan village Industrial Zone, Gaoxin Development Zone, Baoji City, Shaanxi Province, China
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